NE-MW100 Microwave Plasma Cleaning Machine
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DESCRIPTION

Microwave Plasma Cleaning MachineNE-MW100 is a kind of advanced equipment that uses microwave energy to produce plasma to clean the surface of objects. It can remove organic matter, photoresist, inorganic matter, oxide layer and other pollutants. It can clean the surface of silicon wafer, gold PAD, aluminum PAD and so on. The cleaning machine has the advantages of convenient operation, high efficiency, clean surface, no scratch, and is conducive to ensuring product quality. There is no air pollution in the cleaning process, and no waste liquid and waste residue are produced. It is a real energy saving and cost reduction.

PARAMETER

EnclosureDimensions1200 (W) × 1200 (D) × 1800 (H) MM


Plasma Generator

Discharge generatorSolid-state power supply
Frequency2.45 GHz
Power1000W(adjustable)




Chamber

MaterialAL6061, military-grade seal
Carrier stage sizeΦ270mm
Volume100L
Dimensions480 (W) * 505 (D) * 410( H) MM
Handling abilityMaximum of 6 wafers ( 8 / 10 inch silicon wafers ) 





Process Control

Gas flow controllerMFC / gas path
Flow Value500SCCM 
Number of gas paths2 process gas path, can support oxygen, argon, nitrogen, hydrogen, argon hydrogen mixed gas, etc.
Pressure gauge
Pirani
Vacuum pumpDry pump, 80m³/h
Interface12'' with recipe store+PLC + industrial computer


Services

ElectricalAC380V, 50/60 Hz
Power CordSuited to region


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

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