DESCRIPTION
The NE-MW100 Microwave Plasma Cleaner is an advanced surface treatment system that utilizes microwave energy to generate plasma for precision cleaning. It effectively removes a wide range of contaminants including organic residues, photoresist, inorganic deposits, and oxide layers.
This system is suitable for cleaning various surfaces such as silicon wafers, gold pads, and aluminum pads. It offers significant advantages including user-friendly operation, high processing efficiency, and scratch-free treatment—ensuring consistent product quality. The cleaning process is entirely dry, producing no air pollutants, liquid waste, or solid residues, making it an environmentally friendly solution that supports both energy conservation and cost reduction.
PARAMETER
| ENCLOSURE | Dimensions | 1200 × 1200 × 1800 mm(L × W × H) |
PLASMA POWER SUPPLY | Power | 0-1000W, continuously variable output |
| Frequency | 2.45GHz | |
CHAMBER | Material | Aluminum Alloy |
| Dimensions | 480 × 505 × 430mm(L × W × H), 104L | |
| Sample Stage Dimensions | Φ270 mm | |
PROCESS CONTROL | Interface | PLC integrated with Industrial PC |
| Gas Channels | x2 MFC, compatible with O₂, Ar, N₂, H₂, etc. | |
| Pressure Gauge | Pneumatic Vacuum Valve (Electrical Control) & Pirani | |
SERVICES | Electrical | 380 VAC, 50-60Hz |
| Power Cord | Suited to region | |
| Compliance | CE |
PRODUCT FEATURES
Fast Deposition Rate
Good Film Quality
Process Stability
High Productivity
Fully Automatic
Simple Operation
RELATED PRODUCTS
Plasma
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