NE-MW100 is a large-scale industrial vacuum microwave plasma cleaning equipment, equipped with a rotating plasma cleaning process platform, stable start stop operation, all-round processing, and more uniform cleaning. Microwave plasma is generated by microwave excitation process gas discharge with a working frequency of 2.45 GHz, mainly producing chemically reactive plasma. The entire discharge process does not require positive and negative electrodes, resulting in minimal self bias and ion impact, avoiding charge accumulation. It is suitable for cleaning sensitive devices (semiconductor chips, microwave devices, etc.). The equipment is mainly used for micro cleaning, activation, modification, oxidation removal, and adhesive removal of material surfaces, and has the characteristics of high efficiency and no damage.