2.45Ghz Microwave Plasma Cleaner NE-MW100
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DESCRIPTION

The NE-MW100 Microwave Plasma Cleaner is an advanced surface treatment system that utilizes microwave energy to generate plasma for precision cleaning. It effectively removes a wide range of contaminants including organic residues, photoresist, inorganic deposits, and oxide layers.

This system is suitable for cleaning various surfaces such as silicon wafers, gold pads, and aluminum pads. It offers significant advantages including user-friendly operation, high processing efficiency, and scratch-free treatment—ensuring consistent product quality. The cleaning process is entirely dry, producing no air pollutants, liquid waste, or solid residues, making it an environmentally friendly solution that supports both energy conservation and cost reduction.

PARAMETER

ENCLOSUREDimensions1200 × 1200 × 1800 mm(L × W × H)

PLASMA POWER SUPPLY 

Power0-1000W, continuously variable output
Frequency2.45GHz

CHAMBER

MaterialAluminum Alloy
Dimensions480 × 505 × 430mm(L × W × H), 104L
Sample Stage DimensionsΦ270 mm

PROCESS CONTROL

InterfacePLC integrated with Industrial PC
Gas Channelsx2 MFC, compatible with O₂, Ar, N₂, H₂, etc.
Pressure GaugePneumatic Vacuum Valve (Electrical Control) & Pirani 

SERVICES

Electrical380 VAC, 50-60Hz
Power CordSuited to region
ComplianceCE


PRODUCT FEATURES

01

Fast Deposition Rate

Fast Deposition Rate

02

Good Film Quality

Good Film Quality

03

Process Stability

Process Stability

04

High Productivity

High Productivity

05

Fully Automatic

Fully Automatic

06

Simple Operation

Simple Operation

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